
%0 Journal Article
%A Chu, Xiaomeng
%A Wu, Yihui
%A Wang, Guangyuan

%D 
%J Chalcogenide Letters

%@ 1584-8663
%V 
%N 
%P {pages}

%T Facile Electrodeposition of WS<sub>2</sub>/Ni<sub>3</sub>S<sub>2</sub> Heterostructure on Nickel Mesh as Binder-Free Electrocatalyst for Enhanced Hydrogen Evolution Reaction
%M doi:10.32604/cl.2026.088086
%U http://www.techscience.com/CL/online/detail/28471


