@Article{CL.2023.204.293,
AUTHOR = {S. M. Alias, M. Z. Mohd Yusoff, M. S. Yahya},
TITLE = {The effects of etching time and hydrogen peroxide concentration on the ZnO/glass substrate},
JOURNAL = {Chalcogenide Letters},
VOLUME = {20},
YEAR = {2023},
NUMBER = {4},
PAGES = {293--299},
URL = {http://www.techscience.com/CL/v20n4/65297},
ISSN = {1584-8663},
ABSTRACT = {The purpose of the study is to determine the best technique for etching ZnO thin films. 
ZnO is deposited on the glass substrate using a radio frequency sputtering equipment. To 
etch the ZnO thin film, hydrogen peroxide (H<sub>2</sub>O<sub>2</sub>) concentrations of 10%, 20%, and 30% 
are utilised, with etching times of 30 and 60 seconds. The optical band gap is lowered after 
a specific quantity of etching, which shows that the film's crystallinity quality has 
improved. The impact of various ZnO thicknesses on the sample's optical properties is 
investigated using OPAL 2 simulator. In comparison to other ZnO layers of varied 
thickness, the OPAL 2 simulation shows that the 400 nm ZnO layer has the lowest 
transmission in the UV wavelength range.},
DOI = {10.15251/CL.2023.204.293}
}