TY  - EJOU
AU  - Alhilfi, D. N. 
AU  - Al-Kabbib, A. S. 

TI  - Characterization and application of electrochemical deposition Cdse thin films
T2  - Chalcogenide Letters

PY  - 2024
VL  - 21
IS  - 8
SN  - 1584-8663

AB  - The electrochemical deposition method created a CdSe thin film on FTO glass substrates. 
The film was examined using field scanning electron microscopy, energy dispersive 
spectroscopy, X-ray diffraction, Raman spectroscopy, and optical and electrochemical 
measurements. The results show that the CdSe nanoparticles were evenly distributed on the 
substrate, with a Cd/Se ratio of 63.30% Se and 36.70% Cd. The XRD revealed a 
polycrystalline, hexagonal structure. The film is n-type semiconductor concentration with a 
carrier concentration of 1.194×10<sup>20</sup>
 cm<sup>-3</sup>
. The CdSe showed 552.5 mF/cm<sup>2</sup>
 of specific 
capacity with energy and a power density of 2.5 mW/cm<sup>2</sup>
 and 9000 mW/cm<sup>2</sup>
, respectively. 
KW  - CdSe
KW  -  Electrodeposition
KW  -  Electrochemical impedance
KW  -  Supercapacitors

DO  - 10.15251/CL.2024.218.641