TY  - EJOU
AU  - Zhu, Zhenjun  
AU  - Liu, Chang  

TI  - Simulation of Anisotropic Crystalline Etching using a Continuous Cellular Automata Algorithm
T2  - Computer Modeling in Engineering \& Sciences

PY  - 2000
VL  - 1
IS  - 1
SN  - 1526-1506

AB  - We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model, which provides improved spatial resolution and accuracy compared with the conventional and the stochastic CA \mbox{methods}. Implementation of a dynamic CA technique provides increased simulation speed and reduced memory requirement (5x). A first ACES software based on common personal computer platforms has been realized. Simulated results of etching match well with experiments. We have developed a new methodology to obtain the etch-rate diagram of anisotropic etching efficiently using both experimental and numerical techniques.
KW  - etching simulation
KW  -  anisotropic etching
KW  -  cellular automata
KW  -  continuous cellular automata

DO  - 10.3970/cmes.2000.001.011