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ARTICLE

High Magnetic Field Annealing Dependent the Morphology and Microstructure of Nanocrystalline Co/Ni Bilayered Films

Donggang Li1,2, Alexandra Levesque2, Qiang Wang1,3,2, Agnieszka Franczak2, Chun Wu1, Jean-Paul Chopart2, Jicheng He1

Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, Shenyang, 110004, China
LACM-DTI, Université de Reims Champagne-Ardenne, B.P. 1039, 51687 Reims Cedex 2, France
Corresponding author. Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, No.3-11 Wenhua Road, Heping District, Shenyang, Liaoning Province, 110004, P.R.China Tel: +86-24-83681726, Fax: +86-24-83681758, E-mail address: wangq@mail.neu.edu.cn

TSP_CMC_207.pdf

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