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Effects of High Magnetic Field and Post-Annealing on the Evaporated Ni/Si (100) Thin Films

Jiaojiao Du1, Guojian Li1, Qiang Wang1,2, Yongze Cao1, Jicheng He1, Yonghui Ma1

Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, Shenyang 110819, China.
Corresponding author. Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, No. 3-11 Wenhua Road, Heping District, Shenyang, Liaoning Province, 110819, P. R. China.

* Corresponding Author:Tel: +86-24-83681726, Fax: +86-24-83681758, E-mail address:email

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