TY  - EJOU
AU  - Long, Yehao 
AU  - Zhong, Jing 
AU  - Zhang, Tongdi 
AU  - Chen, Li 
AU  - Zhang, Lijun 

TI  - Multiscale Simulation of Microstructure Evolution during Preparation and Service Processes of Physical Vapor Deposited c-TiAlN Coatings
T2  - Computers, Materials \& Continua

PY  - 2024
VL  - 79
IS  - 3
SN  - 1546-2226

AB  - Physical Vapor Deposited (PVD) TiAlN coatings are extensively utilized as protective layers for cutting tools, renowned for their excellent comprehensive performance. To optimize quality control of TiAlN coatings for cutting tools, a multi-scale simulation approach is proposed that encompasses the microstructure evolution of coatings considering the entire preparation and service lifecycle of PVD TiAlN coatings. This scheme employs phase-field simulation to capture the essential microstructure of the PVD-prepared TiAlN coatings. Moreover, cutting simulation is used to determine the service temperature experienced during cutting processes at varying rates. Cahn-Hilliard modeling is finally utilized to consume the microstructure and service condition data to acquaint the microstructure evolution of TiAlN coatings throughout the cutting processes. This methodology effectively establishes a correlation between service temperature and its impact on the microstructure evolution of TiAlN coatings. It is expected that the present multi-scale numerical simulation approach will provide innovative strategies for assisting property design and lifespan prediction of TiAlN coatings.
KW  - Multiscale; phase-field; TiAlN coatings; PVD; cutting

DO  - 10.32604/cmc.2024.051629