TY  - EJOU
AU  - Kakimoto, Koichi 
AU  - Liu, Lijun 

TI  - Flow Instability of Silicon Melt in Magnetic Fields
T2  - Fluid Dynamics \& Materials Processing

PY  - 2006
VL  - 2
IS  - 3
SN  - 1555-2578

AB  - This paper deals with the investigation of the flow instability of molten silicon in a magnetic field during crystal growth by means of the Czochralski method. The flow exhibits a three-dimensional structure due to a transverse non-axisymmetric pattern of the magnetic field. The melt-crystal interface is found to be nearly two-dimensional. The azimuthal non-uniformity of the temperature field is much weaker on the crystal and crucible sidewalls in the case of high rotation rates of crucible and crystal than in the case of non-rotating crucible and crystal.
KW  - Magnetic fields
KW  -  Computer simulation
KW  -  Global modeling
KW  -  Czochralski method
KW  -  Semiconductor silicon

DO  - 10.3970/fdmp.2006.002.167