@Article{fdmp.2007.003.303,
AUTHOR = {A.  Pereira, P.M.J.  Trevelyan, U.  Thiele, S.  Kalliadasis},
TITLE = {Thin Films in the Presence of Chemical Reactions},
JOURNAL = {Fluid Dynamics \& Materials Processing},
VOLUME = {3},
YEAR = {2007},
NUMBER = {4},
PAGES = {303--316},
URL = {http://www.techscience.com/fdmp/v3n4/24255},
ISSN = {1555-2578},
ABSTRACT = {We investigate the interaction between thin films and chemical reactions by using two prototype systems: a thin liquid film falling down a planar inclined substrate in the presence of an exothermic chemical reaction and a horizontal thin liquid film with a reactive mixture of insoluble surfactants on its surface. In the first case the chemical reaction has a stabilizing influence on the dynamics of the film and dampens the free-surface solitary pulses. In the second case the chemical reaction can destabilize the film and lead to the formation of free-surface solitary pulses.},
DOI = {10.3970/fdmp.2007.003.303}
}