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Study on Reaction Diffusion Behavior in NG-Al/CG-Cu Diffusion Couple

B. Xu1, W.P. Tong1, H. Zhang1, L. Zuo1, J. C. He1

1 Key Laboratory of Electromagnetic Processing of Materials, Ministry of Education, Northeastern University, Shenyang 110819, China

TSP_SL_139.pdf

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