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A Numerical Model for Elastoplastic Rough Contact

P. Sainsot1, C. Jacq2, D. Nélias1

Laboratoire de M ´ecanique des Contacts (UMR CNRS 5514), INSA Lyon, 20 Av. A. Einstein, 69621 Villeurbanne Cedex, France
SNECMA, Direction Technique, Centre de Villaroche, 77550 Moissy Cramayel, France

Computer Modeling in Engineering & Sciences 2002, 3(4), 497-506. https://doi.org/10.3970/cmes.2002.003.497

Abstract

Pressure distributions calculated in the simulation of rough contacts show high values and induce high stresses just beneath the surface. These stresses often exceed the yield strength of the material, therefore, a purely elastic contact model is restrictive. Plastic flow occurs and modifies the surface shape and consequently modifies the surface pressure.
This paper presents a numerical model for 3D-elastoplastic rough contact. It allows the determination of real pressure and permanent surface displacement (flattening of asperities) as well as residual stresses and plastic strains useful in fatigue analysis. The material is assumed to follow the Von-Mises yield criterion with isotropic hardening.
The use of FFT in the numerical procedure allows a large number of meshing points so real surfaces obtained from a measurement can be considered.

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Cite This Article

APA Style
Sainsot, P., Jacq, C., , D.N. (2002). A numerical model for elastoplastic rough contact. Computer Modeling in Engineering & Sciences, 3(4), 497-506. https://doi.org/10.3970/cmes.2002.003.497
Vancouver Style
Sainsot P, Jacq C, DN. A numerical model for elastoplastic rough contact. Comput Model Eng Sci. 2002;3(4):497-506 https://doi.org/10.3970/cmes.2002.003.497
IEEE Style
P. Sainsot, C. Jacq, and D.N. "A Numerical Model for Elastoplastic Rough Contact," Comput. Model. Eng. Sci., vol. 3, no. 4, pp. 497-506. 2002. https://doi.org/10.3970/cmes.2002.003.497



cc Copyright © 2002 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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