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Plasma Etching to Enhance Visibility of Nano Particles in Nanocomposites

Kunigal N.Shivakumar1, Shivalingappa Lingaiah2, Robert Sadler2, Matthew Sharpe2

Research Professor and Director, Center for Composite Materials Research, Department of Mechanical Engineering, North Carolina A&T State University, Greensboro, NC 27411
Center for Composite Materials Research, North Carolina A&T State University, Greensboro, NC 27411

Computers, Materials & Continua 2004, 1(4), 309-318. https://doi.org/10.3970/cmc.2004.001.309

Abstract

The exfoliation and dispersion of nanoclay (2% by weight) and nanovermiculite (2% by weight) particles in a polymer matrix is analyzed using the Scanning Electron Microscope (SEM) after a low temperature air plasma etch. The plasma etch preferentially removes the polymer to expose the nanoparticles. Both Argon and air have been used as the etching media to study the etching process. SEM analysis illustrate the results of the etching in flat and edge surfaces of both nanoclay (MMT) and nanovermiculite (VMT) filled polymer. Both the MMT and VMT were dispersed using a IKA high shear mixer and a Sonicator.

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APA Style
N.Shivakumar, K., Lingaiah, S., Sadler, R., Sharpe, M. (2004). Plasma etching to enhance visibility of nano particles in nanocomposites. Computers, Materials & Continua, 1(4), 309-318. https://doi.org/10.3970/cmc.2004.001.309
Vancouver Style
N.Shivakumar K, Lingaiah S, Sadler R, Sharpe M. Plasma etching to enhance visibility of nano particles in nanocomposites. Comput Mater Contin. 2004;1(4):309-318 https://doi.org/10.3970/cmc.2004.001.309
IEEE Style
K. N.Shivakumar, S. Lingaiah, R. Sadler, and M. Sharpe "Plasma Etching to Enhance Visibility of Nano Particles in Nanocomposites," Comput. Mater. Contin., vol. 1, no. 4, pp. 309-318. 2004. https://doi.org/10.3970/cmc.2004.001.309



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