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Research on the Fabrication and Properties of Si₃N₄ Ceramic Radomes via Vat Photopolymerization (VPP)

Jiamin Wu^1,2,3,*, Zhicong Luo^1,2, Fulin Zhou^1,2, Qiwen Wang^1,2, Weikang Li^1,2, Weihao Cai^1,2, Sen Su^1,2, Lin Guo^1,2, Chunsheng Ye^1,2, Yusheng Shi^1,2

1 State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, China
2 Engineering Research Center of Ceramic Materials for Additive Manufacturing, Ministry of Education, Wuhan, 430074, China
3 Wenzhou Key Laboratory of Microwave Communication Materials and Devices, Wenzhou Advanced Manufacturing Institute of HUST, Wenzhou, 325035, China

* Corresponding Author: Jiamin Wu. Email:

The International Conference on Computational & Experimental Engineering and Sciences 2025, 33(4), 1-1. https://doi.org/10.32604/icces.2025.011860

Abstract

Silicon nitride (Si₃N₄) ceramics with outstanding comprehensive properties, have become important candidate materials for components like radomes and antenna windows. In this study, the vat photopolymerization (VPP) technique was used to fabricate Si₃N₄ ceramic radomes. Our research centered on optimizing the curing properties of ceramic slurries and precisely regulating the comprehensive properties of the ceramics. Several methods were proposed to modify the curing depth of Si₃N₄ ceramic slurry, including thermosetting resin coating, sintering aid coating, oxidation coating, double coating, etc. Moreover, a pore-forming agent modification method was also proposed, which enabled the VPP printing of Si₃N₄ ceramic parts with well-controlled pore structure. Subsequently, the correlations among process parameters, microstructure, and the properties of Si₃N₄ ceramics were successfully established. This research intended to offer a valuable reference for the further research and application of Si₃N₄ ceramics in the radome field.

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