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Fabrication and evaluation of CuAlSe2/Si photodetector

H. K. Hassuna, B. K. H. Al-Maiyalya, A. H. Shabanb,*

a Department of physics, college of Education for pure sciences Ibn Al-Haitham, University of Baghdad, Iraq
b College of Science, University of Baghdad, Baghdad, Iraq

* Corresponding Author: email

Chalcogenide Letters 2023, 20(2), 145-152. https://doi.org/10.15251/CL.2023.202.145

Abstract

In this work, we have examined the spectral response of (p-CuAlSe2/n-Si) detector, (CAS) thin films deposited by thermal evaporation at RT with a thickness (450) nm, and annealing temperature at (473K) for 2 h. Optical transmission measurements displayed reasonably slight transmission besides higher absorbance trendy the visible region, energy gaps were observed by annealing, were found to be direct, and decreased with the effect of annealing. The extreme responsivity value arises at wavelength 459 nm, with improvement value of specific detectivity and quantum efficiency the annealing films be situated originate as greatest suitable aimed at numerous device application.

Keywords

Photodetector, CuAlSe2/Si, Thin films, Thermal evaporation, Annealing

Cite This Article

APA Style
Hassun, H.K., Al-Maiyaly, B.K.H., Shaban, A.H. (2023). Fabrication and evaluation of CuAlSe2/Si photodetector. Chalcogenide Letters, 20(2), 145–152. https://doi.org/10.15251/CL.2023.202.145
Vancouver Style
Hassun HK, Al-Maiyaly BKH, Shaban AH. Fabrication and evaluation of CuAlSe2/Si photodetector. Chalcogenide Letters. 2023;20(2):145–152. https://doi.org/10.15251/CL.2023.202.145
IEEE Style
H.K. Hassun, B.K.H. Al-Maiyaly, and A.H. Shaban, “Fabrication and evaluation of CuAlSe2/Si photodetector,” Chalcogenide Letters, vol. 20, no. 2, pp. 145–152, 2023. https://doi.org/10.15251/CL.2023.202.145



cc Copyright © 2023 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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