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Tensoelectric properties of (BixSb1-x)2Te3 films under the influence of a microwave field

R. U. Siddikov*, Kh. M. Sulaymonov, N. Kh. Yuldashev

Fergana State Technical University, Fergana, Uzbekistan

* Corresponding Author: email

Chalcogenide Letters 2025, 22(10), 855-862. https://doi.org/10.15251/CL.2025.2210.855

Abstract

This paper presents the results of an experimental study of the tens metric and dielectric properties of polycrystalline (BixSb1-x)2Te3 films in the temperature range of 280−480 K and at microwave frequencies. The temperature dependences of the specific conductivity, impedance, and permittivity under the action of uniaxial static deformation are analyzed. The deformation phenomena detected in polycrystalline films under the action of a microwave field are qualitatively interpreted based on the effective medium theory.

Keywords

Polycrystalline film, (BixSb1-x)2Te3, Electrical conductivity, Microwave field, Impedance, Permittivity, Tens metric parameters, Technological factors

Cite This Article

APA Style
Siddikov, R.U., Sulaymonov, K.M., Yuldashev, N.K. (2025). Tensoelectric properties of (BixSb1-x)2Te3 films under the influence of a microwave field. Chalcogenide Letters, 22(10), 855–862. https://doi.org/10.15251/CL.2025.2210.855
Vancouver Style
Siddikov RU, Sulaymonov KM, Yuldashev NK. Tensoelectric properties of (BixSb1-x)2Te3 films under the influence of a microwave field. Chalcogenide Letters. 2025;22(10):855–862. https://doi.org/10.15251/CL.2025.2210.855
IEEE Style
R.U. Siddikov, K.M. Sulaymonov, and N.K. Yuldashev, “Tensoelectric properties of (BixSb1-x)2Te3 films under the influence of a microwave field,” Chalcogenide Letters, vol. 22, no. 10, pp. 855–862, 2025. https://doi.org/10.15251/CL.2025.2210.855



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