We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model, which provides improved spatial resolution and accuracy compared with the conventional and the stochastic CA \mbox{methods}. Implementation of a dynamic CA technique provides increased simulation speed and reduced memory requirement (5x). A first ACES software based on common personal computer platforms has been realized. Simulated results of etching match well with experiments. We have developed a new methodology to obtain the etch-rate diagram of anisotropic etching efficiently using both experimental and numerical techniques.
Cite This Article
APA Style
Zhu, Z., Liu, C. (2000). Simulation of anisotropic crystalline etching using a continuous cellular automata algorithm. Computer Modeling in Engineering & Sciences, 1(1), 11-20. https://doi.org/10.3970/cmes.2000.001.011
Vancouver Style
Zhu Z, Liu C. Simulation of anisotropic crystalline etching using a continuous cellular automata algorithm. Comput Model Eng Sci. 2000;1(1):11-20 https://doi.org/10.3970/cmes.2000.001.011
IEEE Style
Z. Zhu and C. Liu, "Simulation of Anisotropic Crystalline Etching using a Continuous Cellular Automata Algorithm," Comput. Model. Eng. Sci., vol. 1, no. 1, pp. 11-20. 2000. https://doi.org/10.3970/cmes.2000.001.011