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Statistics of High Purity Nickel Microstructure From High Energy X-ray Diffraction Microscopy

C.M. Hefferan1, S.F. Li1, J. Lind1, U. Lienert2, A.D. Rollett3, P. Wynblatt3, R.M. Suter1,3

Department of Physics, Carnegie Mellon University, Pittsburgh, PA USA.
Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.
Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, PA, USA.

Computers, Materials & Continua 2009, 14(3), 209-220. https://doi.org/10.3970/cmc.2009.014.209

Abstract

We have measured and reconstructed via forward modeling a small volume of microstructure of high purity, well annealed nickel using high energy x-ray diffraction microscopy (HEDM). Statistical distributions characterizing grain orientations, intra-granular misorientations, and nearest neighbor grain misorientations are extracted. Results are consistent with recent electron backscatter diffraction measurements. Peaks in the grain neighbor misorientation angle distribution at 60 degrees (∑3) and 39 degrees (∑9) have resolution limited widths of ≈ 0.14 degree FWHM. The analysis demonstrates that HEDM can recover grain and grain boundary statistics comparable to OIM volume measurements; more extensive data sets will lead to full, five parameter grain boundary character distributions. Due to its non-destructive nature, HEDM can then watch, both statistically and through tracking of individual grains and boundaries, the evolution of such distributions with processing of the sample.

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APA Style
Hefferan, C., Li, S., Lind, J., Lienert, U., Rollett, A. et al. (2009). Statistics of high purity nickel microstructure from high energy x-ray diffraction microscopy. Computers, Materials & Continua, 14(3), 209-220. https://doi.org/10.3970/cmc.2009.014.209
Vancouver Style
Hefferan C, Li S, Lind J, Lienert U, Rollett A, Wynblatt P, et al. Statistics of high purity nickel microstructure from high energy x-ray diffraction microscopy. Comput Mater Contin. 2009;14(3):209-220 https://doi.org/10.3970/cmc.2009.014.209
IEEE Style
C. Hefferan et al., "Statistics of High Purity Nickel Microstructure From High Energy X-ray Diffraction Microscopy," Comput. Mater. Contin., vol. 14, no. 3, pp. 209-220. 2009. https://doi.org/10.3970/cmc.2009.014.209



cc Copyright © 2009 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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