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High Magnetic Field Annealing Dependent the Morphology and Microstructure of Nanocrystalline Co/Ni Bilayered Films

Donggang Li1,2, Alexandra Levesque2, Qiang Wang1,3,2, Agnieszka Franczak2, Chun Wu1, Jean-Paul Chopart2, Jicheng He1

Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, Shenyang, 110004, China
LACM-DTI, Université de Reims Champagne-Ardenne, B.P. 1039, 51687 Reims Cedex 2, France
Corresponding author. Key Laboratory of Electromagnetic Processing of Materials (Ministry of Education), Northeastern University, No.3-11 Wenhua Road, Heping District, Shenyang, Liaoning Province, 110004, P.R.China Tel: +86-24-83681726, Fax: +86-24-83681758, E-mail address:

Computers, Materials & Continua 2012, 30(3), 207-218.


Co/Ni bilayered films were prepared on ITO glass by electrodeposition assisted with a magnetic field up to 0.5T aligned parallel to the electrode surface. The effect of a high magnetic field annealing up to 12T on morphology and microstructure of the post-deposited films was investigated by field emission scanning electronic microscopy (FE-SEM), X-ray diffraction (XRD) and atomic force microscopy (AFM). Grain shape and grain boundary in the Co/Ni morphology were modified dramatically when the high magnetic field was applied during the annealing process. Magnetic anisotropy appeared in the films due to the preferential orientation of fcc-CoNi alloy in comparison with a weaker orientation of hcp-Co. High magnetic field annealing favored to form a more homogeneous surface with smaller grain size and lower roughness, compared with the annealed samples obtained in the absence of magnetic field. The influencing mechanisms of high magnetic field annealing on the microstructure evolution in the Co/Ni electrodeposits are interpreted in terms of the overlapping effects: diffusion, recrystallization, grain growth and magnetic domains.


Cite This Article

D. . Li, A. . Levesque, Q. . Wang, C. . Wu, J. . Chopart et al., "High magnetic field annealing dependent the morphology and microstructure of nanocrystalline co/ni bilayered films," Computers, Materials & Continua, vol. 30, no.3, pp. 207–218, 2012.

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