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Characterization and application of electrochemical deposition Cdse thin films

D. N. Alhilfia,*, A. S. Al-Kabbibb

a Polymer Research Center, University of Basrah, Basrah 61004, Iraq
b Department of Physics, College of Science, University of Basrah, Basrah 61004, Iraq

* Corresponding Author: email

Chalcogenide Letters 2024, 21(8), 641-649. https://doi.org/10.15251/CL.2024.218.641

Abstract

The electrochemical deposition method created a CdSe thin film on FTO glass substrates. The film was examined using field scanning electron microscopy, energy dispersive spectroscopy, X-ray diffraction, Raman spectroscopy, and optical and electrochemical measurements. The results show that the CdSe nanoparticles were evenly distributed on the substrate, with a Cd/Se ratio of 63.30% Se and 36.70% Cd. The XRD revealed a polycrystalline, hexagonal structure. The film is n-type semiconductor concentration with a carrier concentration of 1.194×1020 cm-3 . The CdSe showed 552.5 mF/cm2 of specific capacity with energy and a power density of 2.5 mW/cm2 and 9000 mW/cm2 , respectively.

Keywords

CdSe, Electrodeposition, Electrochemical impedance, Supercapacitors

Cite This Article

APA Style
Alhilfi, D.N., Al-Kabbib, A.S. (2024). Characterization and application of electrochemical deposition Cdse thin films. Chalcogenide Letters, 21(8), 641–649. https://doi.org/10.15251/CL.2024.218.641
Vancouver Style
Alhilfi DN, Al-Kabbib AS. Characterization and application of electrochemical deposition Cdse thin films. Chalcogenide Letters. 2024;21(8):641–649. https://doi.org/10.15251/CL.2024.218.641
IEEE Style
D.N. Alhilfi and A.S. Al-Kabbib, “Characterization and application of electrochemical deposition Cdse thin films,” Chalcogenide Letters, vol. 21, no. 8, pp. 641–649, 2024. https://doi.org/10.15251/CL.2024.218.641



cc Copyright © 2024 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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