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Thin Films in the Presence of Chemical Reactions

A. Pereira1, P.M.J. Trevelyan2, U. Thiele3, S. Kalliadasis1

Department of Chemical Engineering, Imperial CollegeLondon, London SW7 2AZ, UK
Centre for Nonlinear Phenomena and Complex Systems, CP 231, Université Libre de Bruxelles, 1050 Brussels, Belgium
Max-Planck-Institutfür Physik komplexer Systeme, Nöthnitzer Str. 38 D-01187 Dresden, Germany. Presentaddress: School of Mathematics, Loughborough University, Loughborough LE11 3TU, UK

Fluid Dynamics & Materials Processing 2007, 3(4), 303-316. https://doi.org/10.3970/fdmp.2007.003.303

Abstract

We investigate the interaction between thin films and chemical reactions by using two prototype systems: a thin liquid film falling down a planar inclined substrate in the presence of an exothermic chemical reaction and a horizontal thin liquid film with a reactive mixture of insoluble surfactants on its surface. In the first case the chemical reaction has a stabilizing influence on the dynamics of the film and dampens the free-surface solitary pulses. In the second case the chemical reaction can destabilize the film and lead to the formation of free-surface solitary pulses.

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APA Style
Pereira, A., Trevelyan, P., Thiele, U., Kalliadasis, S. (2007). Thin films in the presence of chemical reactions. Fluid Dynamics & Materials Processing, 3(4), 303-316. https://doi.org/10.3970/fdmp.2007.003.303
Vancouver Style
Pereira A, Trevelyan P, Thiele U, Kalliadasis S. Thin films in the presence of chemical reactions. Fluid Dyn Mater Proc. 2007;3(4):303-316 https://doi.org/10.3970/fdmp.2007.003.303
IEEE Style
A. Pereira, P. Trevelyan, U. Thiele, and S. Kalliadasis "Thin Films in the Presence of Chemical Reactions," Fluid Dyn. Mater. Proc., vol. 3, no. 4, pp. 303-316. 2007. https://doi.org/10.3970/fdmp.2007.003.303



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