Shams B. Ali1, Sarmad Fawzi Hamza Alhasan1, Evan T. Salim2,*, Forat H. Alsultany3, Omar S. Dahham4,5
Journal of Renewable Materials, Vol.10, No.11, pp. 2819-2834, 2022, DOI:10.32604/jrm.2022.021609
Abstract The pulsed laser deposition (PLD) technology was used to effectively create conductive nano and micro hafnium oxide with great purity and transparency for (HfO2) nanofilms. In many optoelectronics devices and their applications, the presence of a high dielectric substance like a nano HfO2, between the metal contacts and the substrates was critical. We used the Pulsed Laser Deposition method to fabricate an Al/HfO2/p-Si Schottky barrier diode where the nanostructured HfO2 films as an intermediate layer and varied substrate temperatures. The optical result reveals a high degree of transparency (93%). The optical bandgap of deposited HfO2 films was observed to vary… More >
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