Jiaojiao Du1, Guojian Li1, Qiang Wang1,2, Yongze Cao1, Jicheng He1, Yonghui Ma1
CMC-Computers, Materials & Continua, Vol.34, No.2, pp. 117-129, 2013, DOI:10.3970/cmc.2013.034.117
Abstract The effects of high magnetic field and post-annealing on the structural, electrical and magnetic properties of the evaporated Ni films were investigated and compared. The in-situ application of a 6 T magnetic field during evaporation or post-annealing at 200°C did not change the crystal structures of the films. However, the magnetic field makes the films exhibit the smallest grain size and the lowest surface roughness. Crystallinity was improved for both the 6 T films and the annealed films. This leads to the enhancement of saturation magnetization (Ms). The value of Ms for the 0 T films was 588 emu/cm3, while… More >
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