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Cold-Induced Accumulation of Low-Molecular-Weight Dehydrins in Etiolated Wheat Seedlings: Relationship with Oxidative Stress Protection and Frost Tolerance

Tetiana O. Yastreb1, Pavel Vítámvás2, Ilja T. Prášil2, Zdeněk Cit2, Ivan V. Shakhov1, Yuriy E. Kolupaev1,3,*

1 Yuriev Plant Production Institute, National Academy of Agrarian Sciences of Ukraine, Kharkiv, Ukraine
2 Czech Agrifood Research Center, Prague, Czech Republic
3 Department of Plant Protection, Poltava State Agrarian University, Poltava, Ukraine

* Corresponding Author: Yuriy E. Kolupaev. Email: email

(This article belongs to the Special Issue: Plant Responses to Stress Factors)

Phyton-International Journal of Experimental Botany 2026, 95(3), 18 https://doi.org/10.32604/phyton.2026.079882

Abstract

Low temperature is a major abiotic stress factor inducing the accumulation of dehydrins in plants. Dehydrins are hydrophilic, heat-stable proteins implicated in plant stress responses; however, their synthesis under cold conditions during the early stages of wheat development has not been sufficiently studied. This study investigated the relationship between cold-induced dehydrin accumulation in etiolated seedlings and frost tolerance in wheat cultivars differing in their level of frost tolerance. Three-day-old seedlings of high frost-tolerant (high-FT) cultivars (Antonivka, Doskonala, and Nordika) and low frost-tolerant (low-FT) cultivars (Tobak, Tonnage, and Altigo) of Triticum aestivum L. were hardened at +3°C for six days. Dehydrin accumulation was analyzed by electrophoretic separation, while frost tolerance was assessed based on seedling survival following freezing at −4, −9, and −12°C. Cold-induced oxidative damage was evaluated by determining malondialdehyde (MDA) content in seedling shoots after freezing at −4°C. In control seedlings, dehydrins were barely detectable in all cultivars. Cold hardening at +3°C induced pronounced accumulation of dehydrins with molecular masses of approximately 46, 49.6, and 68 kDa in both high-FT and low-FT cultivars. In contrast, low-molecular-weight dehydrins (14–16 kDa) were detected predominantly in high-FT cultivars. Seedling survival after freezing at −12°C showed a strong positive correlation with total dehydrin content (r = 0.82). Even stronger correlations were observed between the content of low-molecular-weight dehydrins (14–16 kDa) and seedling survival after freezing at −9 and −12°C (r = 0.84 and 0.94, respectively). An inverse correlation was found between 14–16 kDa dehydrin content and MDA accumulation following freezing at −4°C (r = −0.87). These results indicate that low-molecular-weight dehydrins play an important role in protecting etiolated wheat seedlings from cold-induced oxidative stress and may serve as reliable biochemical markers of frost tolerance.

Graphic Abstract

Cold-Induced Accumulation of Low-Molecular-Weight Dehydrins in Etiolated Wheat Seedlings: Relationship with Oxidative Stress Protection and Frost Tolerance

Keywords

Cold stress; dehydrins; frost tolerance; oxidative stress; Triticum aestivum L.; wheat seedlings

Supplementary Material

Supplementary Material File

Cite This Article

APA Style
Yastreb, T.O., Vítámvás, P., Prášil, I.T., Cit, Z., Shakhov, I.V. et al. (2026). Cold-Induced Accumulation of Low-Molecular-Weight Dehydrins in Etiolated Wheat Seedlings: Relationship with Oxidative Stress Protection and Frost Tolerance. Phyton-International Journal of Experimental Botany, 95(3), 18. https://doi.org/10.32604/phyton.2026.079882
Vancouver Style
Yastreb TO, Vítámvás P, Prášil IT, Cit Z, Shakhov IV, Kolupaev YE. Cold-Induced Accumulation of Low-Molecular-Weight Dehydrins in Etiolated Wheat Seedlings: Relationship with Oxidative Stress Protection and Frost Tolerance. Phyton-Int J Exp Bot. 2026;95(3):18. https://doi.org/10.32604/phyton.2026.079882
IEEE Style
T. O. Yastreb, P. Vítámvás, I. T. Prášil, Z. Cit, I. V. Shakhov, and Y. E. Kolupaev, “Cold-Induced Accumulation of Low-Molecular-Weight Dehydrins in Etiolated Wheat Seedlings: Relationship with Oxidative Stress Protection and Frost Tolerance,” Phyton-Int. J. Exp. Bot., vol. 95, no. 3, pp. 18, 2026. https://doi.org/10.32604/phyton.2026.079882



cc Copyright © 2026 The Author(s). Published by Tech Science Press.
This work is licensed under a Creative Commons Attribution 4.0 International License , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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