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  • Open Access


    The Temperature-Quantum-Correction Effect on the MD-Calculated Thermal Conductivity of Silicon Thin Films

    Tai-Ming Chang1, Chien-Chou Weng1, Mei-Jiau Huang1,2, Chun-KaiLiu2, Chih-Kuang Yu2

    CMES-Computer Modeling in Engineering & Sciences, Vol.50, No.1, pp. 47-66, 2009, DOI:10.3970/cmes.2009.050.047

    Abstract We employ the non-equilibrium molecular dynamics (NEMD) simulation to calculate the in-plane thermal conductivity of silicon thin films of thickness 2.2nm and 11nm. To eliminate the finite-size effect, samples of various lengths are simulated and an extrapolation technique is applied. To perform the quantum correction which is necessary as the MD simulation temperature is lower than Debye temperature, the confined phonon spectra are obtained in advance via the EMD simulations. The investigation shows the thermal conductivities corrected based on the bulk and thin-film phonon densities of states are very close and they agree excellently with the theoretical predictions of a… More >

  • Open Access


    Numerical Modeling of Short-Pulse Laser Interactions with Multi-Layered Thin Metal Films

    E. Majchrzak1, B. Mochnacki2, A. L. Greer3, J. S. Suchy4

    CMES-Computer Modeling in Engineering & Sciences, Vol.41, No.2, pp. 131-146, 2009, DOI:10.3970/cmes.2009.041.131

    Abstract Multi-layered thin metal film subjected to a short-pulse laser heating is considered. Mathematical description of the process discussed bases on the equation in which there appear the relaxation time and the thermalization time (dual-phase-lag-model). In this study we develop a three level implicit finite difference scheme for numerical modelling of heat transfer in non-homogeneous metal film. At the interfaces an ideal contact between successive layers is assumed. At the stage of computations a solution of only one three-diagonal linear system corresponds to transition from time t to t + Δt. The mathematical model, numerical algorithm and examples of computations are… More >

  • Open Access


    Molecular Dynamics Study of Size Effects and Deformation of Thin Films due to Nanoindentation

    Arun K. Nair1, Diana Farkas2, Ronald D. Kriz1

    CMES-Computer Modeling in Engineering & Sciences, Vol.24, No.2&3, pp. 239-248, 2008, DOI:10.3970/cmes.2008.024.239

    Abstract The indentation response of Ni thin films of thicknesses in the nano scale was studied using molecular dynamics simulations with embedded atom method (EAM) interatomic potentials. Simulations were performed in single crystal films in the [111] orientation with thicknesses of 7nm and 33nm. In the elastic regime, the loading curves observed start deviating from the Hertzian predictions for indentation depths greater than 2.5% of the film thickness. The observed loading curves are therefore dependent on the film thickness. The simulation results also show that the contact stress necessary to emit the first dislocation under the indenter is nearly independent of… More >

  • Open Access


    Molecular-Dynamics Analysis of Grain-Boundary Grooving in Interconnect Films with Underlayers

    T. Iwasaki1 and H. Miura1

    CMES-Computer Modeling in Engineering & Sciences, Vol.4, No.5, pp. 551-558, 2003, DOI:10.3970/cmes.2003.004.551

    Abstract We have developed a molecular-dynamics technique for investigating migration-induced failures in interconnect films for ULSIs. This technique was used to simulate grain-boundary grooving in Al and Cu films. The simulations showed that the grain-boundary grooves are formed by atomic diffusion at the grain boundary. To clarify what kind of underlay material is effective in suppressing this diffusion, we calculated the dependence of groove depth on the kind of underlay material. The calculation showed that the groove depth of the Al film decreases in the order: Al/Ta, Al/W, and Al/TiN while that of the Cu film decreases in the order: Cu/TiN,… More >

  • Open Access


    Dislocation Nucleation and Propagation During Thin Film Deposition Under Tension

    W. C. Liu, S. Q. Shi, C. H. Woo, Hanchen Huang1

    CMES-Computer Modeling in Engineering & Sciences, Vol.3, No.2, pp. 213-218, 2002, DOI:10.3970/cmes.2002.003.213

    Abstract Using molecular dynamics method, we study the nucleation of dislocations and their subsequent propagation during the deposition of tungsten thin films under tension. Aiming to reveal the generic mechanisms of dislocation nucleation during the deposition of polycrystalline thin films, the case of tungsten on a substrate of the same material is considered. The substrate is under uniaxial tension along the [111] direction, with the thermodynamically favored (01ˉˉ1) surface being horizontal. The simulation results indicate that the nucleation starts with a surface step, where a surface atom is pressed into the film along the [111ˉˉ] direction. This process leads… More >

  • Open Access


    Thermal Stress Analysis of Multi-layer Thin Films and Coatings by an Advanced Boundary Element Method

    Xiaolin Chen, Yijun Liu1

    CMES-Computer Modeling in Engineering & Sciences, Vol.2, No.3, pp. 337-350, 2001, DOI:10.3970/cmes.2001.002.337

    Abstract An advanced boundary element method (BEM) is developed in this paper for analyzing thin layered structures, such as thin films and coatings, under the thermal loading. The boundary integral equation (BIE) formulation for steady-state thermoelasticity is reviewed and a special case, that is, the BIE for a uniform distribution of the temperature change, is presented. The new nearly-singular integrals arising from the applications of the BIE/BEM to thin layered structures under thermal loading are treated in the same way as developed earlier for thin structures under the mechanical loading. Three 2-D test problems involving layered thin films and coatings on… More >

  • Open Access


    The Influence of Annealing in Nitrogen Atmosphere on the Electrical, Optical and Structural Properties of Spray-Deposited ZnO Thin Films

    Shadia J Ikhmayies1, Naseem M. Abu El-Haija2, Riyad N. Ahmad-Bitar3

    FDMP-Fluid Dynamics & Materials Processing, Vol.6, No.2, pp. 219-232, 2010, DOI:10.3970/fdmp.2010.006.219

    Abstract Large area and highly uniform polycrystalline ZnO thin films have been produced by a spray pyrolysis (SP) technique resorting to a customized system (spraying) on glass substrates at temperature Ts= 450℃. This study deals with the related investigation about the influence of heat treatment (in nitrogen atmosphere) on the resulting properties (electrical, optical and structural) of such films. Properties are analyzed by means of I-V plots, transmittance curves, X-Ray diffractograms (XRD) and scanning electron microscope (SEM) micrographs. Results show that the resistivity of the films decreases from about 200W.cm for the as-deposited films to about 95W.cm for annealed films. XRD… More >

  • Open Access


    Characterization of Undoped Spray-Deposited ZnO Thin Films of Photovoltaic Applications

    ShadiaJ. Ikhmayies1, Naseem M. Abu El-Haija1, Riyad N. Ahmad-Bitar1

    FDMP-Fluid Dynamics & Materials Processing, Vol.6, No.2, pp. 165-178, 2010, DOI:10.3970/fdmp.2010.006.165

    Abstract Undoped polycrystalline ZnO thin films were produced on glass substrates at a substrate temperature Ts= 450 C by the spray pyrolysis (SP) technique. The films were characterized by analyzing their I-V curves, transmittance, X-ray diffractograms (XRD) and their scanning electron microscope (SEM) images. The I-V plots are all linear and the resistivity was found to be about 200W.cm. The transmittance in the visible and near infrared regions is as high as 85% which is suitable for solar cell applications. The absorption coefficient which is deduced from the transmittance measurements is continuously increasing with the photon's energy and it rapidly increases… More >

  • Open Access


    Comparison of EHD-Driven Instability of Thick and Thin Liquid Films by a Transverse Electric Field

    Payam Sharifi1, Asghar Esmaeeli2

    FDMP-Fluid Dynamics & Materials Processing, Vol.9, No.4, pp. 389-418, 2013, DOI:10.3970/fdmp.2013.009.389

    Abstract This study aims to explore the effect of liquid film thickness on the electrohydrodynamic-driven instability of the interface separating two horizontal immiscible liquid layers. The fluids are confined between two electrodes and the light and less conducting liquid is overlaid on the heavy and more conducting one. Direct Numerical Simulations (DNSs) are performed using a front tracking/finite difference scheme in conjunction with Taylor-Melcher leaky dielectric model. For the range of physical parameters used here, it is shown that for a moderately thick lower liquid layer, the interface instability leads to formation of several liquid columns and as a result of… More >

  • Open Access


    Thin Films in the Presence of Chemical Reactions

    A. Pereira1, P.M.J. Trevelyan2, U. Thiele3, S. Kalliadasis1

    FDMP-Fluid Dynamics & Materials Processing, Vol.3, No.4, pp. 303-316, 2007, DOI:10.3970/fdmp.2007.003.303

    Abstract We investigate the interaction between thin films and chemical reactions by using two prototype systems: a thin liquid film falling down a planar inclined substrate in the presence of an exothermic chemical reaction and a horizontal thin liquid film with a reactive mixture of insoluble surfactants on its surface. In the first case the chemical reaction has a stabilizing influence on the dynamics of the film and dampens the free-surface solitary pulses. In the second case the chemical reaction can destabilize the film and lead to the formation of free-surface solitary pulses. More >

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